Optics: measuring and testing – Lamp beam direction or pattern
Reexamination Certificate
2008-09-23
2011-11-15
Nguyen, Hung Henry (Department: 2882)
Optics: measuring and testing
Lamp beam direction or pattern
C355S053000, C355S077000
Reexamination Certificate
active
08059266
ABSTRACT:
Systems and methods for measuring stray light in a lithographic apparatus are described using Radiometric Kirk Test (also known as Scanning SAMOS Test). The Radiometric Kirk Test of the present invention involves a test pattern having an isolated dark area within a much larger bright field. The radiometric Kirk test includes at least two continuous or stepped scans of an aperture of a detector in an image plane of a lithographic system. During a dark area measurement, the aperture of the detector is positioned such that at least at one point the aperture of the detector is centered within an image of the dark area. During a bright area measurement, the aperture of the detector is positioned within the image of the bright field. The integrated detector signal is correspondingly computed for the dark area measurement and the bright area measurement. The ratio of the integrated dark area measurement result and integrated bright area measurement result is a measure of stray light present in the lithographic apparatus.
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Machine translation of JP 2006-080245 published Mar. 23, 2006.
English language Abstract of Japanese Patent Publication No. 2004-289119 A, Published Oct. 14, 2004; 1 page.
English language Abstract of Japanese Patent Publication No. 2006-080245 A, Published Mar. 23, 2006; 1 page.
English translation of Japanese Notification of Reasons for Refusal directed to related Japanese Patent Application 2008-250003, Japanese Patent Office, mailed Apr. 19, 2011; 2 pages.
Cuperus Minne
Hult David A.
Mulder Heine Melle
ASML Holding N.V.
ASML Netherlands B.V.
Gordon Steven H Whitesell
Nguyen Hung Henry
Sterne Kessler Goldstein & Fox P.L.L.C.
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