Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Structurally defined
Reexamination Certificate
2006-04-18
2006-04-18
Schilling, Richard L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Structurally defined
C430S021000, C430S139000, C252S30160S, C252S30140H, C250S484400, C427S157000, C427S255390
Reexamination Certificate
active
07029836
ABSTRACT:
A radiographic image conversion panel including a support, and at least one photostimulable phosphor layer formed on the support by a vapor phase deposition method (vapor phase growth). The panel is manufactured according to deposition, and a temperature of the support at the time of deposition is controlled at 50° C. to 150° C.
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patent: 2005/0040340 (2005-02-01), Morikawa et al.
patent: 1385050 (2004-01-01), None
Patent Abstracts of Japan (1 pg) vol. 13, No. 096, Mar. 7, 1989.
Patent Abstracts of Japan (1 pg) vol. 10, No. 239, Aug. 19, 1986.
Honda Satoshi
Maezawa Akihiro
Morikawa Osamu
Nakano Kuniaki
Konica Minolta Holdings Inc.
Lucas & Mercanti LLP
Schilling Richard L.
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