Radio frequency monitor for semiconductor process control

Details Radio frequency monitor for semiconductor process control Radio frequency monitor for semiconductor process control

1993-12-07

1995-11-14

Karlsen, Ernest F.

Electricity: measuring and testing

Measuring, testing, or sensing electricity, per se

With coupling means

324 95, 324126, G01R 120, G01R 2101

Patent

active

054670136

ABSTRACT:
A RF sensor for monitoring voltage, current and phase angle of a RF signal being coupled to a plasma reactor. Outputs from the sensor are used to calculate various properties of the plasma. These values are then utilized to characterize the process and/or used to provide feedback for in-situ control of an ongoing plasma process.

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patent: 5175472 (1992-12-01), Johnson, Jr. et al.
patent: 5273610 (1993-12-01), Thomas, III et al.
"Measurement and analysis of radio frequency glow discharge electrical impedance and network power loss", J. W. Butterbaugh et al., J. Vac. Sci. Technol. A 8(2), Mar./Apr. 1990, pp. 916-923 and Erratum, p. 578.
"Electrical characterization of radio-frequency discharges in the Gaseous Electronics Conference Reference Cell", Mark A. Sobolewski, J. Vac. Sci. Technol. A 10(6), Nov./Dec. 1992, pp. 3550-3562.
"Electrical measurements for monitoring and control of rf plasma processing", M. A. Sobolewski et al., SPIE vol. 1803 (1992), pp. 309-320.
"Beyond RF-Power Measurements", Paul Miller et al., NCSL meeting, Santa Clara, 11 Feb. 1993, pp. 1-16.

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