Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Reexamination Certificate
2005-06-14
2005-06-14
Vo, Tuyet Thi (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
C315S111710, C315S111410, C250S426000, C250S42300F, C250S42300F
Reexamination Certificate
active
06906469
ABSTRACT:
An rf ion source suitable for low power operation over a range of pressures in air which comprises discharge electrode, a cathode and an anode, the cathode being connected to an rf signal supply through an associated coupling means and the anode adapted to provide a surface area over which a plasma discharge may occur no greater than substantially that of the cathodal area over which the discharge may occur. The anode and cathode are arranged to be maneuverable with respect to one another in order to reduce the power requirements of the system and provide a means of controlling the rf discharge and ionization. An extended rf ion source, comprising a series of electrode pairs, provides flexibility for use in a variety of circumstances.
REFERENCES:
patent: 4092543 (1978-05-01), Levy
patent: 4521719 (1985-06-01), Liebel
patent: 4630566 (1986-12-01), Asmussen et al.
patent: 5444258 (1995-08-01), Grigoryan et al.
patent: 5684300 (1997-11-01), Taylor et al.
patent: 5849372 (1998-12-01), Annaratone et al.
patent: 5877593 (1999-03-01), Langford et al.
patent: 6407382 (2002-06-01), Spangler
patent: 420360 (1934-11-01), None
patent: 2296369 (1996-06-01), None
patent: 2311411 (1997-09-01), None
patent: 01244619 (1989-09-01), None
patent: WO 93/11554 (1993-06-01), None
patent: WO 96/19822 (1996-06-01), None
patent: WO 00/75953 (2000-12-01), None
Japanese Patent Abstract No. 08306499, Nov. 22, 1996.
Japanese Patent Abstract No. 63206484, Aug. 25, 1988.
Cairns Stuart Neville
Langford Marian Lesley
Marr Andrew John
Pleasants Ian Blair
Kilpatrick & Stockton
Russell Dean W.
The Secretary of State for Defence
Vo Tuyet Thi
LandOfFree
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