Radiation system and lithographic apparatus

Details Radiation system and lithographic apparatus Radiation system and lithographic apparatus

2007-08-28

2007-08-28

Nguyen, Kiet T. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S50400H, C378S034000

Reexamination Certificate

active

11292310

ABSTRACT:
A radiation system for generating a beam of radiation is disclosed. The radiation system includes a pulsed EUV source for generating EUV radiation, and a spectral filter mounted in front of the EUV source for selectively passing a spectral range of a beam of EUV radiation from the EUV source. The spectral filter is mounted on a movable mount configured to be moved in synchronicity with the pulsed EUV source to prevent debris traveling from the EUV source from impacting the spectral filter. Accordingly, the spectral filter is kept substantially free from contamination by the debris.

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patent: 2002/0001363 (2002-01-01), Kondo
patent: 2006/0245044 (2006-11-01), Apetz et al.
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European Search Report issued in EP Application NO. 06 07 7059 dated May 3, 2007.

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