Radiation-stimulated deposition of aluminum

Coating processes – Electrical product produced – Welding electrode

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

2041571R, C23C 1700

Patent

active

044891024

ABSTRACT:
A method for depositing aluminum films on a substrate comprises exposing the substrate to vapors of an aluminum hydride-trialkylamine complex and exposing the surface to ultraviolet light in the areas where aluminum deposition is desired.

REFERENCES:
patent: Re27606 (1973-04-01), Schmidt et al.
patent: 3271180 (1966-09-01), White
patent: 3364087 (1968-01-01), Solomon et al.
patent: 3375129 (1968-03-01), Carley et al.
patent: 3386823 (1968-06-01), Keller et al.
patent: 3462288 (1969-08-01), Schmidt et al.
patent: 4006269 (1977-02-01), Kerfoot
patent: 4324854 (1982-04-01), Beauchamp et al.
Physics Today Oct. 1980, pp. 21,22.
Ehrlich et al. IEEE Journal of Quantum Electronics vol. QE-16 No. 11, Nov. 1980, pp. 1233-1243.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Radiation-stimulated deposition of aluminum does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Radiation-stimulated deposition of aluminum, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation-stimulated deposition of aluminum will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1988544

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.