Radiation source and lithographic apparatus

Details Radiation source and lithographic apparatus Radiation source and lithographic apparatus

2011-05-31

2011-05-31

Wells, Nikita (Department: 2881)

Radiant energy

Radiant energy generation and sources

With radiation modifying member

C250S365000, C250S372000, C250S515100, C250S492100, C355S030000

Reexamination Certificate

active

07952084

ABSTRACT:
A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel is contacted by a beam of radiation to form a plasma, a collector constructed and arranged to collect extreme ultraviolet radiation formed at the plasma formation site and form an extreme ultraviolet radiation beam, and a contamination barrier. The contamination barrier includes a plurality of foils at least partially located between the plasma formation site and the collector, and a rotatable base operatively connected to the plurality of foils. The rotatable base is configured to allow the beam of radiation to pass through the contamination barrier to the plasma formation site.

REFERENCES:
patent: 7737425 (2010-06-01), Bakker et al.
patent: 2003/0006383 (2003-01-01), Melnychuk et al.
patent: 2004/0184014 (2004-09-01), Bakker et al.
patent: 2005/0199829 (2005-09-01), Partlo et al.
patent: 2006/0192151 (2006-08-01), Bowering et al.
patent: 2007/0114469 (2007-05-01), Partlo et al.
patent: 2010/0200772 (2010-08-01), Bakker et al.
patent: 1 274 287 (2005-06-01), None
European Search Report for European Application No. 09005144.2 dated Jul. 2, 2009.

Affiliated with

Also associated with

Rating

Radiation source and lithographic apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Radiation source and lithographic apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation source and lithographic apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2689326