Radiation shadow projection exposure system

Details Radiation shadow projection exposure system Radiation shadow projection exposure system

1981-04-30

1982-09-07

Hayes, Monroe H.

Photocopying

Projection printing and copying cameras

Illumination systems or details

353102, G03B 2754

Patent

active

043481051

ABSTRACT:
A radiation system for projecting a uniform field of irradiance to expose an irradiance-sensitive surface (such as a photomask) through a transparency in proximity to, or in contact with, the irradiance sensitive surface (such as a wafer or another mask) comprises a pulsed source of irradiance in the near and deep ultraviolet wavelength spectrum, a doublet condenser lens and doublet field lens disposed serially along an optical axis. Every point in the exposure plane surface is focused on the transparency which is in the exposure plane. The two planes are conjugates of each other and vice versa. For every opening in the mask pattern to be resolved on a photoresist coated wafer or mask there exists a well-defined ray bundle passing through the conjugate point located on the exposure plane conjugate surface. One advantage of the doublet field lens is that its large diameter makes possible the transmission of marginal ray bundles without vignetting on the exposure plane.

REFERENCES:
patent: 3860335 (1980-01-01), Caprari
patent: 4243917 (1981-01-01), Caprari
D. A. Doane, "Optical Lithography in the 1-.mu.m Limit," Solid State Technology, Aug. 1980, pp. 101-114.
Jenkins and White, Fundamentals of Optics, McGraw-Hill, 1957, pp. 52-53.

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