Radiation-sensitive resist composition with an admixture of cis-

Details Radiation-sensitive resist composition with an admixture of cis- Radiation-sensitive resist composition with an admixture of cis-

1985-12-16

1988-02-02

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430156, 430165, 430166, 430167, 430197, 430270, 430272, 430280, 430281, 430296, 430313, 430323, 430325, 430326, 430966, 430967, G03C 160, G03C 171

Patent

active

047228814

ABSTRACT:
This invention relates to a radiation-sensitive composition having resistance to oxygen reactive-ion etching and a process for forming a pattern by using the same.
The radiation-sensitive composition of this invention comprises a mixture of cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasiloxane and a polysilsesquioxane, said mixture containing 5 to 100 wt. % of cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasiloxane, and a resist containing a phenolic resin soluble in an aqueous alkali solution.

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patent: 4600685 (1986-07-01), Kitakohji et al.
patent: 4657843 (1987-04-01), Fukuyama et al.
Conant, D. H., Research Disclosure, #13147, 3/1975, pp. 52-53.

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