Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1989-02-15
1990-10-16
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430192, 430270, 430190, 430325, G03F 7022, G03C 160
Patent
active
049634631
ABSTRACT:
A radiation-sensitive resin composition comprising a quinonediazide-type radiation-sensitive resin and a compound generating an acid upon irradiation. Said radiation-sensitive resin composition can be used as a resist suitable for dry development by plasma etching and enables one to obtain an etching image having high precision with high reproducibility at a high degree of resolution and selectivity.
REFERENCES:
patent: 3969118 (1976-07-01), Stahlhofen et al.
patent: 4160671 (1979-07-01), Stahlhofen
patent: 4163672 (1979-08-01), Stahlhofen
patent: 4247611 (1981-01-01), Sander et al.
patent: 4279982 (1981-07-01), Iwasaki et al.
patent: 4365019 (1982-12-01), Daly et al.
patent: 4458000 (1984-07-01), Stahlhofen
patent: 4467025 (1984-08-01), Goto et al.
patent: 4701399 (1987-10-01), Nagano et al.
patent: 4758497 (1988-07-01), Shah et al.
patent: 4772534 (1988-09-01), Kawamura et al.
patent: 4840869 (1989-06-01), Kita et al.
patent: 4857435 (1989-08-01), Hopf et al.
Harita Yoshiyuki
Koshiba Mitsunobu
Roland Bruno
Vandendriesshe Jan
Yamada Keiichi
Bowers Jr. Charles L.
Japan Synthetic Rubber Co. Ltd.
UCB Societe Anonyme
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