Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1999-01-27
2000-02-01
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, 430193, G03F 7023
Patent
active
060201045
ABSTRACT:
A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymono-carboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.
REFERENCES:
patent: 5215857 (1993-06-01), Hosaka et al.
patent: 5405720 (1995-04-01), Hosaka et al.
Harita Yoshiyuki
Hosaka Yoshihiro
Nozue Ikuo
Takatori Masashige
JSR Corporation
Kelber Steven B.
Young Christopher G.
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