Radiation-sensitive resin composition

Details Radiation-sensitive resin composition Radiation-sensitive resin composition

1998-10-02

2000-04-11

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430192, 430193, 430326, G03F 7023, G03F 730

Patent

active

060486597

ABSTRACT:
A radiation-sensitive resin composition including (1) an alkali-soluble resin, (2) a quinonediazide compound and (3) a mixed solvent including a monoketone having 7 to 14 carbon atoms and an alkoxypropionic acid alkyl ester is provided. The composition can be coated in a uniform thickness in a small coating weight. The composition has a high sensitivity and a high resolution, and also enables formation of resist patterns having a superior pattern shape with less pattern defects. Thus, it is suitable as a positive resist.

REFERENCES:
patent: 5719004 (1998-02-01), Lu et al.
patent: 5837417 (1998-11-01), Rahman et al.
patent: 5853948 (1998-12-01), Sawano et al.
patent: 5948587 (1999-09-01), Kawabe et al.
Derwent Abstracts, AN 97-376739, JP 09 160231, Jun. 20, 1997.
Derwent Abstracts, AN 97-376736, JP 09 160228, Jun. 20, 1997.

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