Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-02-19
1993-08-24
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430190, 430191, 430193, 430326, 534556, 534557, G03F 7023, G03F 732
Patent
active
052387755
ABSTRACT:
A radiation-sensitive resin composition containing an alkali-soluble resin, comprising a polyhydroxy compound having the following formula: ##STR1## or a quinonediazidesulfonate of the polyhydroxy compound. The radiation-sensitive resin composition is suitable for use as a positive type photoresist which has such excellent developability as to inhibit effectively the generation of scum in the formation of a photoresist pattern, has high sensitivity and is excellent in heat resistance and remained thickness ratio upon development.
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Kajita Toru
Miura Takao
Okuda Chozo
Yumoto Yoshiji
Bowers Jr. Charles L.
Chu John S.
Japan Synthetic Rubber Co. Ltd.
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