Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1997-12-10
1999-12-28
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430192, 430193, 430326, G03F 7023, G03F 730
Patent
active
060079614
ABSTRACT:
A radiation-sensitive resin composition including an alkali soluble resin and a quinonediazide compound is provided. The quinonediazide compound has the formula (1), for example: ##STR1## wherein, R.sup.1 to R.sup.6 are an alkyl, cycloalkyl or aryl group; a and b are an integer of 1 to 3; D.sup.1 and D.sup.2 are independently a hydrogen atom or a 1,2-quinonediazidosulfonyl group, provided that at least one of D.sup.1 is a 1,2-quinonediazidosulfonyl group; A is a bonding such as single bond; and x and y are an integer of 0 to 2. The composition is suitable as a positive resist, which effectively restrains the occurrence of scum, and excellent in developability, pattern shape, sensitivity, resolution and focus latitude.
REFERENCES:
patent: 5554481 (1996-09-01), Kawabe et al.
patent: 5738968 (1998-04-01), Hosoda et al.
patent: 5747218 (1998-05-01), Motota et al.
patent: 5750310 (1998-05-01), Sato et al.
patent: 5798201 (1998-08-01), Inomata et al.
Akiyama Masahiro
Inomata Katsumi
Iwanaga Shin-ichiro
Tsuji Akira
Chu John S.
JSR Corporation
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