Radiation sensitive resin composition

Details Radiation sensitive resin composition Radiation sensitive resin composition

1997-11-06

1999-11-30

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

4302701, 430905, 430908, 430910, 430920, G03F 7004

Patent

active

059940220

ABSTRACT:
A radiation sensitive resin composition useful as a chemically amplified positive tone resist is provided. The composition comprises (A) a copolymer which becomes soluble in an alkali developing solution by the action of an acid, the copolymer containing a recurring unit (I) having a structure which is decomposed by the action of an acid and increases the solubility in an alkaline developing solution and a recurring unit(II) obtained from a compound having at least two (meth)acryloyl groups in the molecule by the cleavage of the carbon-carbon double bond, and (B) a photoacid generator which produces an acid on being irradiated by a radiation. The composition exhibits high resolution, superb capability of producing superior pattern forms, and excellent resistance to PED, and high process stability, is affected by a standing wave only to a minimum extent, and possessed prominent heat resistance.

REFERENCES:
patent: 4600683 (1986-07-01), Greco et al.
patent: 4925768 (1990-05-01), Iwasaki et al.
patent: 5759739 (1998-06-01), Takemura et al.

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