Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-06-13
1995-12-26
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430191, 430192, 430193, G03F 7023, G03F 730
Patent
active
054786916
ABSTRACT:
A radiation-sensitive resin composition comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein the alakli-soluble novolak resin comprises a mixture of:
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Miura Takao
Miyashita Satoshi
Nozue Ikuo
Yamanouchi Akihiro
Chu John S.
Japan Synthetic Rubber Co. Ltd.
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