Radiation-sensitive recording material having radiation-sensitiv

Details Radiation-sensitive recording material having radiation-sensitiv Radiation-sensitive recording material having radiation-sensitiv

1987-06-09

1989-06-27

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430162, 430166, 430168, 430271, 430273, 430300, 430302, 430950, G03C 174, G03C 154, G03F 716

Patent

active

048429821

ABSTRACT:
Disclosed is a radiation-sensitive recording material comprising a support, a radiation-sensitive recording layer and a rough covering layer which is applied by spraying and drying a solution which has substantially the same composition as the recording layer. Due to its rough surface, the material provides for accelerated vacuum contact in the copying process. Also disclosed is a process for producing the radiation-sensitive recording material described above.

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Suwa Seikosha, Forming Method of Photo Resist Patterns, May 18, '79, vol. 3 No. 85 (E-124).
Daicel K. K., Exposed Photosensitive Diazo Film for Making Screen Plate, May 27, 1982, vol. 6, No. 168 (P-139).
English Language Abstract of Japanese Patent 58-11943, Published 1/1983.

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