Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1993-10-22
1995-07-11
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430192, G03F 7023
Patent
active
054320399
ABSTRACT:
A radiation sensitive resin composition for microlens comprising (a) an alkali-soluble resin, (b) a 1,2-quinonediazide compound, (c) a compound having at least 2 epoxy groups in the molecule, (d) a melamine and (e) a trihalomethyltriazine or an onium salt, which composition exhibits high sensitivity, high resolution and high yield of residual film thickness in the formation of a lens pattern and is small in dependency on heating conditions in the preparation of a microlens.
REFERENCES:
patent: 5183722 (1993-02-01), Tsutsumi et al.
Database WPI, Derwent Publications, AN 92-205553, JP-A-4136858, May 11, 1992.
Bessho Nobuo
Endo Masayuki
Shimada Atsufumi
Shimokawa Tsutomu
Bowers Jr. Charles L.
Japan Synthetic Rubber Co. Ltd.
Young Christopher G.
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