Radiation-sensitive positive resist composition comprising an o-

Details Radiation-sensitive positive resist composition comprising an o- Radiation-sensitive positive resist composition comprising an o-

1993-03-31

1994-02-22

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430192, 430193, 430326, G03F 7023, G03F 732

Patent

active

052885879

ABSTRACT:
A positive resist composition which comprises a 1,2-quinone diazide compound and an alkali-soluble resin containing a polyphenol compound (I) of the general formula: ##STR1## wherein R is a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, and n is a number of 0 to 3, which has good sensitivity, improved resolution and heat resistance.

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World Patent Index; Abstract: JP 63261267.

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