Radiation-sensitive positive resist composition comprising an al

Details Radiation-sensitive positive resist composition comprising an al Radiation-sensitive positive resist composition comprising an al

1993-04-19

1995-04-04

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430193, G03F 7023, G03F 730

Patent

active

054036968

ABSTRACT:
A positive resist composition comprising a 1,2-quinone diazide compound and an alkali-soluble resin which comprises a resin (I) obtainable through a condensation reaction of an aldehyde with a phenol mixture containing m-cresol and at least one selected from the group consisting of 2-tert.-butyl-4-methylphenol and 2-tert.-butyl-6-methylphenol, which has well balanced properties.

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English Abstract of Jap. 1-180535.

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