Radiation-sensitive positive resist composition comprising an al

Details Radiation-sensitive positive resist composition comprising an al Radiation-sensitive positive resist composition comprising an al

1994-05-11

1995-04-18

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430193, G03F 7023, G03F 730

Patent

active

054077800

ABSTRACT:
A positive resist composition containing a 1,2-quinone diazide compound and an alkali-soluble resin which constitutes a resin (I) obtainable through a condensation reaction of a phenol mixture containing m-cresol and 2-tert.-butyl-5-methylphenol with an aldehyde., which has well balanced sensitivity, resolution and heat resistance properties.

REFERENCES:
patent: 4123279 (1978-10-01), Kobayashi
patent: 4308368 (1981-12-01), Kubo et al.
patent: 4477553 (1984-10-01), Yamamoto et al.
patent: 4731319 (1988-03-01), Kohara et al.
patent: 4797346 (1989-01-01), Yamamoto et al.
patent: 4812551 (1989-03-01), Oi et al.
patent: 4906549 (1990-03-01), Asaumi et al.
patent: 4920028 (1990-04-01), Lazarus et al.
patent: 4978810 (1990-12-01), Kanayama et al.
patent: 4983492 (1991-01-01), Trefonas, III et al.
patent: 4988601 (1991-01-01), Ushirogouchi et al.
patent: 5001040 (1991-03-01), Blakeney et al.
patent: 5019479 (1991-05-01), Oka et al.
Derwent Publications Ltd., London GB and JP-A-1180535 (Konika, Mitsubishi Kasei) abstract only.

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