Radiation-sensitive positive resist composition comprising a 1,2

Details Radiation-sensitive positive resist composition comprising a 1,2 Radiation-sensitive positive resist composition comprising a 1,2

1992-09-22

1999-01-19

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430192, 430193, G03F 7023

Patent

active

058612297

ABSTRACT:
A positive resist composition which comprises a 1,2-quinone diazide compound and an alkali-soluble resin containing a polyphenol compound (I) of the general formula:

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