Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-04-07
1995-10-10
Chu, John S. Y.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430192, 430193, G03F 7023
Patent
active
054569958
ABSTRACT:
A positive resist composition which comprises, in admixture, a photosensitive 1,2-quinone diazide compound, an alkali-soluble resin to bind ingredients and polyphenol compound to control a dissolution rate in a developer represented by the formula: ##STR1## wherein R is C.sub.1-18 or hydrogen, the composition is sensitive to radiation and has good balance of sensitivity, resolving power and heat resistance.
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Patent Abstracts of Japan, vol. 9, No. 323, p. 414, (Dec. 1985), JP 60150047(1).
Hanabata Makoto
Hioki Takeshi
Oi Fumio
Ozaki Haruyoshi
Uetani Yasunori
Chu John S. Y.
Sumitomo Chemical Company Limited
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