Radiation-sensitive positive resist composition

Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430192, 430193, G03F 7023

Patent

active

057833559

ABSTRACT:
A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, 1, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.

REFERENCES:
patent: 3188210 (1965-06-01), Fritz et al.
patent: 4626492 (1986-12-01), Eilbeck
patent: 4731319 (1988-03-01), Kohara et al.
patent: 4738915 (1988-04-01), Komine et al.
patent: 4797346 (1989-01-01), Yamamoto et al.
patent: 4812551 (1989-03-01), Oi et al.
patent: 4920028 (1990-04-01), Lazarus et al.
patent: 4971887 (1990-11-01), Schmitt et al.
patent: 5019479 (1991-05-01), Oka et al.
patent: 5128230 (1992-07-01), Templeton et al.
patent: 5153096 (1992-10-01), Uenishi et al.
patent: 5215856 (1993-06-01), Jayaraman
WPIL, No. 90-150423, Derwent Publications Ltd, London, GB Derwent Abstract of Jap. Pub. 1-180535 (Jul. 1989).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Radiation-sensitive positive resist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Radiation-sensitive positive resist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation-sensitive positive resist composition will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1645500

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.