Radiation-sensitive positive resist

Details Radiation-sensitive positive resist Radiation-sensitive positive resist

1979-07-25

1981-03-31

Wong, Jr., Harry

Stock material or miscellaneous articles

Composite

Of fluorinated addition polymer from unsaturated monomers

20415922, 526245, 526246, B32B 2716, B32B 2730, C08F 1418

Patent

active

042594073

ABSTRACT:
A radiation-sensitive positive resist which is prepared from a homogeneous polymer of any one of the various forms of halogenated alkyl .alpha.-halogenated acrylate expressed by the general structural formula: ##STR1## where: X = fluorine, chlorine or bromine

REFERENCES:
patent: 2877207 (1959-03-01), Cox et al.
patent: 3053815 (1962-09-01), Barr
Kakuchi et al., Poly (Fluoro Methacrylate) as Highly Sensitive, High Contrast Positive Resist, 124 J. Electrochem. Soc. 1648, (1977).

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