Radiation-sensitive polymers which form a metal complex, process

Details Radiation-sensitive polymers which form a metal complex, process Radiation-sensitive polymers which form a metal complex, process

1987-09-11

1989-08-15

Schofer, Joseph L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

526285, C08F 406, C08F 3800

Patent

active

048576140

ABSTRACT:
Polymers consisting of (a) vinyl compounds having a 2,2'-bipyridyl side group, (b) vinyl compounds having a radiation-sensitive side group and, if appropriate, (c) olefines which differ from (a) and (b), and their complexes with metal compounds, with the exception of alkali metal and alkaline earth metal compounds. They are suitable for coating substrates and for the preparation of photographic relief images. Complexes with cobalt salts are effective catalysts for the polymerization of acetylene.

REFERENCES:
patent: 4193297 (1980-03-01), Baumann et al.
patent: 4424359 (1984-01-01), Kaschig et al.
patent: 4603185 (1986-07-01), Benton et al.
patent: 4713422 (1987-12-01), Kaschig et al.

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