Radiation-sensitive polymers having sulfonyl urthane side chains

Details Radiation-sensitive polymers having sulfonyl urthane side chains Radiation-sensitive polymers having sulfonyl urthane side chains

1992-11-23

1993-10-19

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430157, 430167, 430175, 430176, 430195, 430197, 430325, 430906, 525 58, 525 59, 525293, 525301, 525502, 525528, 522 32, 522149, 552 8, G03F 7012, G03F 7016, G03F 7021, C08F 800

Patent

active

052544311

ABSTRACT:
A radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture comprises a polymer having appendent azide-substituted aromatic ester groups and sulphonyl urethane groups. The radiation sensitive compound is produced by a process in which some hydroxyl and/or epoxide groups of a polymer are reacted with an azide substituted carboxylic acid or ester forming derivative thereof, and some hydroxyl groups are reacted with a sulphonyl isocyanate.

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patent: 4857428 (1989-08-01), Koike
patent: 5008362 (1991-04-01), Wilharm et al.
Chemical Abstracts 4079h vol. 74, 1971.

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