Radiation-sensitive polymers containing naphthoquinone-2-diazide

Details Radiation-sensitive polymers containing naphthoquinone-2-diazide Radiation-sensitive polymers containing naphthoquinone-2-diazide

1992-02-26

1994-04-12

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430192, 430193, 534557, G03F 7023

Patent

active

053024885

ABSTRACT:
A radiation-sensitive polymer and a mixture containing this radiation-sensitive polymer as a binder are disclosed. A process for the preparation of the radiation-sensitive polymer binder and a positive-working radiation-sensitive recording material which is prepared using the radiation-sensitive mixture are also disclosed.

REFERENCES:
patent: 3779778 (1973-12-01), Smith et al.
patent: 3837860 (1974-09-01), Roos
patent: 3902906 (1975-09-01), Iwama et al.
patent: 4139384 (1979-02-01), Iwasaki et al.
patent: 4308368 (1981-12-01), Kubo et al.
patent: 4910123 (1990-03-01), Endo et al.
patent: 5178986 (1993-01-01), Zampini et al.
Willson (1983) Introduction to Microlithography: Theory, Materials and Processing 219(3):87-159.
Sugiyama et al. (Nov. 1988) 51-61, positive excimer laser resists prepared with aliphatic diazoketones.
Tani et al. (1989) SPIE: Advances in Resist Technology and Processing VI 1086: 22-33, a new positive resist KrF excimer laser lithography.
Schwartzkopf (1988) SPIE: Advances in Resist Technology and Processing V 920: 51-58, 2-diazocyclohexane-1,3-dione photoactive compounds for deep U.V. lithography.
Willson et al. (1987) SPIE: Advances in Resist Technology and Processing IV 771: 1-10, new diazoketone dissolution inhibitors for deep U.V. photolithography.
Crivello (Dec. 1983) Polymer Engineering and Science 23(17): 953-956, possibilities for photoimaging using onium salts.
Houlihan et al. (1988) SPIE: Advances in Resist Technology and Processing V 920: 67-74, an evaluation of nitrobenzyl ester chemistry for chemical amplification resists.
Patent Abstracts of Japan, vol. 5, No. 88 (P-65) Jun. 9, 1981 & JP-A-56 035 129.
Patent Abstracts of Japan, vol. 13, No. 242 (P-880) Jun. 7, 1989 & JP-A-1 044 934.

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