Radiation sensitive polymers and use thereof

Details Radiation sensitive polymers and use thereof Radiation sensitive polymers and use thereof

1988-08-29

1990-10-23

Michl, Paul R.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

525102, 5253261, 5253335, 525364, 526240, 526279, C08F 800, C08L 8300

Patent

active

049653164

ABSTRACT:
Organometal-containing polymers having side chains of the formula I ##STR1## in which, for example, M is Si, X is O, R.sup.1 and R.sup.2 are hydrogen and R.sup.4 to R.sup.6 are each methyl and which have an average molecular weight between 1,000 and 1,000,000, are suitable for the preparation of dry-developable photoresists, such as are required for the generation of structured images, in particular in microelectronics.

REFERENCES:
patent: 4433044 (1984-02-01), Meyer et al.
patent: 4491628 (1985-01-01), Ito et al.
patent: 4689288 (1987-08-01), Buiguez et al.
Microcircuit Eng., 471-481 (1985).
H. Franke, Appl. Phys. Lett., 45(1), 110 et seq. (1984).

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