Radiation-sensitive polymers and positive-working recording mate

Details Radiation-sensitive polymers and positive-working recording mate Radiation-sensitive polymers and positive-working recording mate

1994-07-12

1995-09-26

Rodee, Christopher D.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Including resin or synthetic polymer

430270, 430326, 428195, G03F 7035, B32B 310

Patent

active

054533414

ABSTRACT:
Radiation-sensitive polymers contain, in the polymer main chain, both acid-labile groups and onium salt groups with nonnucleophilic counterions and are suitable for the production of semiconductor structural elements.

REFERENCES:
patent: 4663269 (1987-05-01), Narang et al.
patent: 4708925 (1987-11-01), Newman
patent: 4816383 (1989-03-01), Taguchi et al.
patent: 4883740 (1989-11-01), Schwalm et al.
patent: 5075199 (1991-12-01), Schwalm et al.
patent: 5130392 (1992-07-01), Schwalm et al.
patent: 5334699 (1994-08-01), Hsieh

Affiliated with

Also associated with

Rating

Radiation-sensitive polymers and positive-working recording mate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Radiation-sensitive polymers and positive-working recording mate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation-sensitive polymers and positive-working recording mate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1551387