Radiation-sensitive polymers

Details Radiation-sensitive polymers Radiation-sensitive polymers

1985-07-18

1988-08-30

Schofer, Joseph L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

525455, 525458, 528 33, 528 75, 528 76, C80F28304

Patent

active

047678267

ABSTRACT:
This invention relates to the preparation of solvent soluble polymeric materials which become insoluble in solvents after exposure to actinic light, x-rays or electron beams.
The polymers are linear block copolymers comprising two segments; a soft segment which forms a continuous phase, and a rigid, crystallizable photoreactive segment which forms a dispersed phase. The rigid segments are chosen from polyurethanes, polyesters, polyamides, and polyureas which contain a diacetylene group in their repeat units. The soft segments are low molecular weight rubbery polymers selected from groups such as polyethers, polyesters, polydienes, and polysiloxanes.
The polymers produced are useful in a wide variety of applications in the field of coatings and graphic arts. More particularly, this invention relates to negative photoresists which are remarkable by their (1) high photosensitivity (2) great latitude in tailoring of film properties, (3) high thermal stability and (4) oxygen insensitivity.

REFERENCES:
patent: 2941010 (1960-06-01), Mann et al.
patent: 3065283 (1962-11-01), Happel et al.
patent: 3300456 (1967-01-01), Hay
patent: 3501297 (1970-03-01), Cremeans
patent: 3501302 (1970-03-01), Foltz
patent: 3501303 (1970-03-01), Foltz
patent: 3594175 (1971-07-01), Hay
patent: 3709860 (1973-01-01), Fischer et al.
patent: 3743505 (1973-07-01), Bloom et al.
patent: 3844791 (1974-10-01), Bloom et al.
patent: 3954816 (1976-05-01), Bloom et al.
patent: 4066676 (1978-01-01), Bloom et al.
patent: 4133723 (1979-01-01), Howard
patent: 4220747 (1980-09-01), Preziosi et al.
patent: 4312798 (1982-01-01), Kovacs
patent: 4379906 (1983-04-01), Chattha
patent: 4396053 (1983-08-01), Davis et al.
patent: 4399239 (1983-08-01), Herwig et al.
patent: 4431263 (1984-02-01), Garito
patent: 4439514 (1984-03-01), Garito
"Substituted Phenylacetyleses. Infrared Spectra", A. D. Allen and C. D. Cook, Canadian Journal of Chem., vol. 41 (1963), pp. 1084-1087.
Journal of Polymer Science, Polymer Physics Edition, Aug. 1974, vol. 12, No. 8, "Solid-State Synthesis of Large Polymer Single Crystals", R. H. Baughman.
"The Solid State Synthesis and Properties of Photoconducting, Metallic, and Superconducting Polymer Crystals", Ray H. Baughman, pp. 205-233, 1978.
Polymer Letters, Journal of Polymer Science, Part B, vol. 9, No. 2, Feb. 1971, John Woley and Sons, pp. 134-144.

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