Radiation-sensitive polymers

Details Radiation-sensitive polymers Radiation-sensitive polymers

1990-01-09

1992-07-14

Schofer, Joseph L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

430170, 430270, 430322, 430325, 522178, 522180, 522182, 522183, 522184, 526239, 526240, 526256, 526286, 526291, 5262923, 526293, G03C 1492, C08F 2802

Patent

active

051303922

ABSTRACT:
Radiation-sensitive polymers suitable for use in positive- and negative-working recording elements contain not only acid-labile groups but also onium salt groups having nonnucleophilic counterions in one and the same molecule.

REFERENCES:
patent: 4069056 (1978-01-01), Crivello
patent: 4150988 (1979-04-01), Crivello
patent: 4175972 (1979-11-01), Crivello
patent: 4175973 (1979-11-01), Crivello
patent: 4491628 (1985-01-01), Ito
patent: 4537854 (1985-08-01), Crivello
patent: 4603101 (1986-07-01), Crivello
patent: 4610952 (1986-09-01), Crivello
patent: 4689289 (1987-08-01), Crivello
patent: 4780511 (1988-10-01), Crivello
patent: 4816383 (1989-03-01), Taguchi et al.
patent: 4840977 (1989-06-01), Crivello
J. Polym. Sci., Part C: Polymer Letters, vol. 26, 77-81 (1988).

Affiliated with

Also associated with

Rating

Radiation-sensitive polymers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Radiation-sensitive polymers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation-sensitive polymers will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-335402