Radiation sensitive polymeric o-nitrophenyl acetals and element

Details Radiation sensitive polymeric o-nitrophenyl acetals and element Radiation sensitive polymeric o-nitrophenyl acetals and element

1977-09-27

1978-12-26

Welsh, John D.

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96115R, 96 351, 20415921, 96 86P, G03C 194

Patent

active

041314654

ABSTRACT:
Radiation-sensitive linear polymers comprise repeating structural units containing an o-nitrophenyl acetal. The polymer is formed, for example, by the linear polycondensation of o-nitrobenzaldehyde with a particular dihydroxy alcohol. The polymers are useful as coatings to form positive-working radiation-sensitive elements such as photoresists or lithographic printing plates.

REFERENCES:
patent: 3984378 (1976-10-01), Kubota et al.
patent: 3991033 (1976-04-01), Kaiser et al.

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