Radiation sensitive polymeric o-nitrophenyl acetals

Details Radiation sensitive polymeric o-nitrophenyl acetals Radiation sensitive polymeric o-nitrophenyl acetals

1976-05-10

1978-04-25

Phynes, Lucille M.

Chemistry of carbon compounds

Miscellaneous organic carbon compounds

96 351, 20415919, 20415921, 260 67A, 260 67FP, C08G 400

Patent

active

040862100

ABSTRACT:
Radiation-sensitive linear polymers comprise repeating structural units containing an o-nitrophenyl acetal. The polymer is formed, for example, by the linear polycondensation of o-nitrobenzaldehyde with a particular dihydroxy alcohol. The polymers are useful as coatings to form positive-working radiation-sensitive elements such as photoresists or lithographic printing plates.

REFERENCES:
patent: 3984378 (1976-10-01), Kubota et al.
patent: 3991033 (1976-11-01), Sam

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