Radiation sensitive polymeric diazonium salt and methods of maki

Details Radiation sensitive polymeric diazonium salt and methods of maki Radiation sensitive polymeric diazonium salt and methods of maki

1989-01-19

1990-02-20

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430302, 5253284, 525337, 525340, 525353, 525374, 534561, 534565, 522 32, G03C 154, C07C11300, C08F 1822, C08F 2034

Patent

active

049026011

ABSTRACT:
Radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture is based on a polymer including a plurality of structural units represented by the formula: ##STR1## in which, R represents H or CH.sub.3 ; each R.sub.1, which may be the same or different represents H or alkyl; R.sub.2 represents a single bond or a substituted or unsubstituted divalent radical; Ar represents a substituted or unsubstituted divalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or NH; A represents an anion; Y represents a carbonyl oxy or aromatic radical; and n is an integer equal to or greater than 1.

REFERENCES:
patent: 3174860 (1965-03-01), Sus et al.
patent: 4581313 (1986-04-01), Minamizoho et al.
patent: 4595648 (1986-06-01), Stanton et al.
patent: 4666993 (1987-05-01), Urano et al.

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