Radiation sensitive polymer materials

Details Radiation sensitive polymer materials Radiation sensitive polymer materials

1982-03-18

1983-12-06

Schofer, Joseph L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

430270, 430296, 430326, 526296, 526310, 526313, 526293, C08F11636, C08F21200, C08F21636

Patent

active

044195060

ABSTRACT:
A radiation sensitive polymer material having (a) one or more repeating units of the formula: ##STR1## wherein R is an alkyl group, a halogen atom, a hydrogen atom or a dimethylamino group, and (b) an addition polymerizable repeating unit derived from a compound having a CH.sub.2 .dbd.C< group in the molecule, can give a positive type resist having excellent resistance to dry etching and being highly sensitive to radiation.

REFERENCES:
patent: 3853814 (1974-12-01), Guillet
patent: 3860538 (1975-01-01), Guillet et al.
patent: 3925269 (1975-12-01), Miyoshi et al.
patent: 4054454 (1977-10-01), Himics et al.
J. Voc. Sci. Technology (16/16), Nov., Dec. 1979, M. Hatzakis.

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