Radiation-sensitive polymer having acid labile groups and onium

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From phenol – phenol ether – or inorganic phenolate

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525462, 528 33, 528 35, 528171, 528174, 528204, C08G 6408

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active

052604101

ABSTRACT:
Radiation-sensitive polymers contain, in the polymer main chain, both acid-labile groups and onium salt groups with nonnucleophilic counterions and are suitable for the production of semiconductor structural elements.

REFERENCES:
Hackh's Chemical Dictionary, Fourth Edition, 1980, p. 10, 473.
Chemical Abstracts, vol. 107, No. 22, Nov. 1987, entry 199167.
Chemical Abstracts, vol. 110, No. 2, Jan. 1989, entry 15901.
Cationic Polymerization . . . , Crivello, Advances in Polymer Science 62, 1984.
Design and Synthesis of Novel Allylic . . . , Frechet et al., Makromol. Chem., Rapid Commun, 7, 121-126 (1986).
Developments in the Design and Application of Novel Thermal . . . Crivello et al, Makromol. Chem. Macromol. Symp. 13/14, 145-160 (1988).
Photosensitive Polymers Containing Diaryliodonium . . . Crivello et al. Journal of Polymer Science, vol. 17, 3845-1858 (1979).
Syntheses of Polymers that Undergo No Shrinkage on Crosslinking Tagoshi et al., Journal of Polymer Sci., vol. 26, 77-81 (1988).
Infra-red Characterization of Oriented . . . Bradley et al., Polymer, 1986, vol. 27, Nov.

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