Radiation-sensitive plates formed using diazonium salts

Details Radiation-sensitive plates formed using diazonium salts Radiation-sensitive plates formed using diazonium salts

1984-09-11

1986-06-17

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430175, 430171, 430157, G03C 154

Patent

active

045956480

ABSTRACT:
A radiation sensitive compound contains at least two groups having the structure ##STR1## in which Ar represents a divalent or other polyvalent radical derived from an aromatic or heteroaromatic compound; X and X' which may be the same or different, each represents O, S or an imino group, provided that at least one of X and X' is an imino group; Y represents O or S; R represents a single bond or a divalent or other polyvalent radical and A.sup.- is an anion. Radiation sensitive compositions comprising the compound and optionally a resin may be used to produce radiation sensitive plates for lithographic printing plate production.

REFERENCES:
patent: 2063631 (1936-12-01), Schmidt et al.
patent: 3808194 (1974-04-01), Piller et al.
patent: 3867147 (1975-02-01), Teuscher
patent: 3970460 (1976-07-01), Jagrovic
patent: 4334006 (1982-06-01), Kitajima et al.

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