Radiation-sensitive mixture, radiation-sensitive recording mater

Details Radiation-sensitive mixture, radiation-sensitive recording mater Radiation-sensitive mixture, radiation-sensitive recording mater

1991-01-30

1994-12-27

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430191, 430192, 430193, 430270, 430907, 430914, G03F 7023, G03F 7004

Patent

active

053764960

ABSTRACT:
A radiation-sensitive mixture, a radiation-sensitive recording material produced from the
mixture, and a process for producing heat-resistant and chemical-resistant relief copies using the recording material are disclosed. The normally positive-working radiation-sensitive mixture contains

REFERENCES:
patent: 3515552 (1970-06-01), Smith
patent: 3779778 (1973-12-01), Smith et al.
patent: 3869292 (1975-03-01), Peters
patent: 4139384 (1979-02-01), Iwasaki et al.
patent: 4189323 (1980-02-01), Buhr
patent: 4247611 (1981-01-01), Sander et al.
patent: 4248957 (1981-02-01), Sander et al.
patent: 4311782 (1982-01-01), Buhr et al.
patent: 4551409 (1985-11-01), Gulla et al.
patent: 4619998 (1986-10-01), Buhr
patent: 4678737 (1987-07-01), Schneller et al.
patent: 4699867 (1987-10-01), Schneller et al.
patent: 4822719 (1989-04-01), Schneller et al.
patent: 4910119 (1990-03-01), Schneller et al.

Affiliated with

Also associated with

Rating

Radiation-sensitive mixture, radiation-sensitive recording mater does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Radiation-sensitive mixture, radiation-sensitive recording mater, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation-sensitive mixture, radiation-sensitive recording mater will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-918446