Radiation-sensitive, ethylenically unsaturated, copolymerizable

Details Radiation-sensitive, ethylenically unsaturated, copolymerizable Radiation-sensitive, ethylenically unsaturated, copolymerizable

1990-01-09

1992-03-31

Dees, Jose G.

Organic compounds -- part of the class 532-570 series

Organic compounds

Heavy metal containing

430281, 430287, 549 3, 549 6, 549 13, 549 80, 549207, 549218, 568 13, 568 23, 568 28, 568 42, C07F 968, C07D33308, G03C 100

Patent

active

051010534

ABSTRACT:
Radiation sensitive sulfonium salts which contain (1) a sulfonium initiator portion, (2) a spacer portion, and (3) a reactive group portion. The spacer portion has the formula "-o-w- x-z-" wherein "w" is a single bond or one of --C(O)--, --C(O)O--, --C(O)S--, --C(O)NH-- --C(O)N(alkyl)--, --C(S)--, --C(S)S--,--S(O)--, --S(O)(O)--, or --S(O)(O)O--; "X" is an unsubstituted or substituted alkylene radical; and "Z" is --O--, --NH--, --N(C,--C.sub.6 -alkyl)--, or --N(phenyl)--. The reactive group portion is --CH.dbd.CH.sub.2 or --C(O)--C(Y).dbd.CH.sub.2 wherein "Y" is H, C.sub.1 -.sub.6 -alkyl, or phenyl. The sulfonium salts find use in curing monomers which can be subjected to cationic polymerization.

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