Radiation-sensitive ester and process for its preparation

Details Radiation-sensitive ester and process for its preparation Radiation-sensitive ester and process for its preparation

1992-04-01

1993-12-07

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430190, 430191, 430192, 430165, 430166, 534555, 534557, G03C 152

Patent

active

052682528

ABSTRACT:
The invention relates to a radiation-sensitive ester which is the condensation product of (a) a compound containing 2 to 6 aromatic hydroxyl groups, (b) a ring-substituted (o-naphthoquinone 2-diazide)-4-sulfonic acid (compound D.sub.1 and (c) an (o-naphthoquinone 2-diazide)-4- or -5-sulfonic acid which is not further substituted (compound D.sub.2) and/or a non-radiation-sensitive organic acid (compound D.sub.0), where the (b):(c) molar ratio is between 0.1:1 and 39:1.

REFERENCES:
patent: 4404272 (1983-09-01), Stahlhofen
patent: 4581321 (1986-04-01), Stahlhofen
patent: 4732836 (1988-03-01), Potvin et al.
patent: 4902785 (1990-02-01), Potvin et al.
patent: 5035976 (1991-07-01), Potvin et al.
patent: 5114816 (1992-05-01), Scheler et al.
patent: 5162510 (1992-11-01), Potvin et al.
European Patent No. 0244762 (Nov. 1987) (abstract only).
German Patent No. 3325022 (Jan. 1985) (abstract only).
Trefonas et al. (1987) SPIE: Advances in Resist Technology and Processing IV 771: 194-210, describes the new principle for image enhancement in single layer positive photoresists.
Trefonas et al. (Aug. 1987) Solid State Technology 30: 131-137, describes photoresist design for submicron optical lithography application of polyphotolysis.
"Patent Abstracts of Japan", vol. 12, No. 235, (P-725)(3082), Jul. 6, 1988; and JP-A-63 027 835, published Feb. 5, 1988.

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