Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1997-01-31
1998-12-08
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430158, 430162, 430175, 430176, 4302781, 430302, G03F 7021, G03F 7095
Patent
active
058466851
ABSTRACT:
A radiation sensitive composition containing an adduct of a diazonium resin having pendant diazonium groups, with a sulfonated acrylic copolymer having pendant sulfonate groups. The sulfonated acrylic copolymer contains an acrylic moiety and a sulfonated styryl or acrylic moiety. The copolymer may optionally contain styryl moieties. The composition is useful as a radiation sensitive layer in imaging elements for graphic arts applications and is particularly useful in preparing durable, long-wear, printing plates.
REFERENCES:
patent: 2714066 (1955-07-01), Jewett et al.
patent: 3849392 (1974-11-01), Steppan
patent: 4401743 (1983-08-01), Incremona
patent: 4408532 (1983-10-01), Incremona
patent: 4543315 (1985-09-01), Lorenz et al.
patent: 4595648 (1986-06-01), Stanton et al.
patent: 4902601 (1990-02-01), Potts et al.
patent: 5120799 (1992-06-01), Wade et al.
patent: 5200291 (1993-04-01), Wanat
patent: 5278022 (1994-01-01), Wade et al.
patent: 5300397 (1994-04-01), Aoshima
patent: 5427887 (1995-06-01), Konuma et al.
patent: 5527655 (1996-06-01), Bonham et al.
Huang Jianbing
Pappas S. Peter
Saraiya Shashikant
Shah Ajay
Chu John S.
Kodak Polychrome Graphics LLC
LandOfFree
Radiation sensitive diazo sulfo-acrylic adducts and method for p does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Radiation sensitive diazo sulfo-acrylic adducts and method for p, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation sensitive diazo sulfo-acrylic adducts and method for p will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-175494