Radiation-sensitive compounds, radiation-sensitive mixture prepa

Details Radiation-sensitive compounds, radiation-sensitive mixture prepa Radiation-sensitive compounds, radiation-sensitive mixture prepa

1989-11-03

1992-05-19

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430193, 534556, 534557, G03F 7023, G03F 7039

Patent

active

051148161

ABSTRACT:
The invention relates to novel radiation-sensitive compounds which are esters or amides of a 1,2-naphthoquinone-(2)-diazide-4-sulfonic acid of the general formula ##STR1## in which R.sub.1 and R.sub.2 are identical or different and denote hydrogen, an alkyl group, an alkyl ether group or an alkyl thioether group whose carbon chains may be interrupted by ether oxygen atoms, an acylamino group, carboxylic acid ester group, sulfonic acid ester group or sulfonamide group,

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