Radiation sensitive compound and mixtures with trinuclear novola

Details Radiation sensitive compound and mixtures with trinuclear novola Radiation sensitive compound and mixtures with trinuclear novola

1988-12-27

1990-09-18

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430190, 430192, 430193, 430326, 534557, G03C 154, G03F 7023

Patent

active

049578464

ABSTRACT:
A trinuclear novolak oligomer of the formula (I): ##STR1## wherein each X is selected from the group consisting of hydroxyl group and halide group and Y is selected from the group consisting of a lower alkyl group having 1-4 carbon atoms and halogen atom.

REFERENCES:
patent: 3384618 (1968-05-01), Imoto et al.
patent: 4407926 (1983-10-01), Stahlhofen
patent: 4439511 (1984-03-01), Stahlhofen
patent: 4477553 (1984-10-01), Yamamoto et al.
patent: 4587196 (1986-05-01), Toukhy
patent: 4614826 (1986-09-01), Katayama et al.
patent: 4642282 (1987-02-01), Stahlhofen
patent: 4837121 (1989-06-01), Blakeney et al.
English Language Abstract of Japanese Publication #62-269,946, Published 11/24/1987.
English Language Abstract of Japanese Publication #62-123,451, Published 06/04/1987.
English Language Abstract of Japanese Patent Publication #62-010646, Published 1/19/87 (Katsuragi et al.).

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