Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-11-04
1994-04-26
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430191, 430192, 430193, 430326, G03F 7023, G03F 730
Patent
active
053065948
ABSTRACT:
A novolak resin composition comprising at least one unit of the reaction product of a para-, para-bonded bisphenol having formula (A): ##STR1## wherein R.sub.1 =hydrogen, lower alkyl group having 1-4 carbon atoms, halogen, or lower alkoxy group having 1-4 carbon atoms;
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Honda et al. "Studies of Dissolution Inhibition Mechanism of DNQ-Novolak Resist (II) Effect of Extended Ortho-Ortho Bond in Novolak", SPIE vol. 1466 Advances in Resist Technology & Processing VIII (1991), p. 141 et seq.
Sarubbi Thomas R.
Sizensky Joseph J.
Bowers Jr. Charles L.
Chu John S.
OCG Microelectronic Materials Inc.
Simons William A.
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