Radiation-sensitive compositions containing fully substituted no

Details Radiation-sensitive compositions containing fully substituted no Radiation-sensitive compositions containing fully substituted no

1991-06-12

1993-08-17

Kight, III, John

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From phenol, phenol ether, or inorganic phenolate

528129, 528155, C08G 804, C08G 1404

Patent

active

052370372

ABSTRACT:
A radiation-sensitive composition dissolved in a solvent comprising:

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Solid State Technology, Jun. 1984, pp. 115-120, T. R. Pampalone "Novolac Resins Used in Positive Resist Systems".
Chen and Rice, "Study of Dryout Resistance of Phenolic Copolymer Resins for Pine Plywood Glues--Parts I and II", Forest Products Journal, vol. 24, No. 3, pp. 20-26 (Mar., 1974) and vol. 25, No. 6, pp. 40-44 (Jun., 1975).
Hanabata, Funita, Uemura "Novolak Design for High Resolution Positive Photoresists" 1977 SPIE Conference, vol. 771, Advances in Resist Technology and Processing (IV), pp. 85-92.

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