Radiation-sensitive compositions containing 5-indanol in the bin

Details Radiation-sensitive compositions containing 5-indanol in the bin Radiation-sensitive compositions containing 5-indanol in the bin

1993-09-20

1994-05-31

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430191, 430192, 430193, G03F 7023, G03F 730

Patent

active

053168844

ABSTRACT:
A phenolic novolak resin composition comprising a condensation product of at least one aldehyde source with a phenolic source comprising 5-indanol. Said phenolic novolak resins are used in radiation-sensitive compositions, especially those useful as positive-working photoresists.

REFERENCES:
patent: 3442893 (1969-05-01), Lynch
patent: 3716350 (1974-06-01), Hall
patent: 3759898 (1973-09-01), Pfizer
patent: 3832381 (1974-08-01), Taylor et al.
patent: 3876562 (1975-04-01), Hall
patent: 3985930 (1976-10-01), Shackle
patent: 4366328 (1992-12-01), Numata et al.
patent: 4418220 (1983-11-01), Numata et al.
patent: 4920028 (1990-04-01), Lazarus et al.
patent: 4943511 (1990-07-01), Lazarus et al.
patent: 4948864 (1990-08-01), Imai et al.
patent: 5250653 (1993-10-01), Toukhy
CA75 (2):6802h-Antioxidants & Stabilizers (1990 American Chemical Society).
CA70 (24):107209x-Use of Porapak type Czechoslovakian Organic Polymer in Thin-Layer (1990 American Chemical Society).
CA68 (20): 92769n-Application of Porous Ethylvinylbenzene Polymers to Thin-Layer Chromatography (1990 American Chemical Society).

Affiliated with

Also associated with

Rating

Radiation-sensitive compositions containing 5-indanol in the bin does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Radiation-sensitive compositions containing 5-indanol in the bin, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation-sensitive compositions containing 5-indanol in the bin will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1627169