Radiation-sensitive compositions and imageable materials

Details Radiation-sensitive compositions and imageable materials Radiation-sensitive compositions and imageable materials

2007-02-13

2007-02-13

Schilling, Richard L. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaged product

Nonsilver image

C430S278100, C430S281100, C430S302000, C430S325000, C430S905000, C430S910000

Reexamination Certificate

active

11356518

ABSTRACT:
A negative-working radiation-sensitive composition includes a polymeric binder comprising a polymer backbone and having attached thereto a carbazole derivative represented by the following Structure (I):wherein Y is a direct bond or a linking group, and R1to R8are independently hydrogen, or an alkyl, alkenyl, aryl, halo, cyano, alkoxy, acyl, acyloxy, or carboxylate groups, or any adjacent R1through R8groups can together form a carbocyclic or heterocyclic group or a fused aromatic ring. The composition can be sensitive to radiation having a maximum wavelength of from about 150 to about 1500 nm, and can be used to prepare negative-working imageable elements that be imaged and developed as lithographic printing plates.

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patent: 2005-187678 (2005-07-01), None
Belfield et al (Eds),Photoinitiated Polymerization, Hua and Crivello, “Photosensitization of Onium Salt Initiated Cationic Photopolymerizations by Carbazole Monomers, Polymers, and Oligomers” ACS 2003, pp. 219-231.

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