Radiation-sensitive composition, polymer and monomer

Details Radiation-sensitive composition, polymer and monomer Radiation-sensitive composition, polymer and monomer

2011-07-12

2011-07-12

Teskin, Fred M (Department: 1762)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C526S282000, C526S313000, C526S323200, C560S190000, C522S113000, C430S270100

Reexamination Certificate

active

07977442

ABSTRACT:
A polymer includes a repeating unit shown by a general formula (1) in which R1represents a hydrogen atom or a methyl group, R2represents a substituted or unsubstituted linear or branched monovalent alkyl group having 1 to 20 carbon atoms, an alicyclic group having 3 to 25 carbon atoms, or an aryl group having 6 to 22 carbon atoms, and X represents a substituted or unsubstituted methylene group or a substituted or unsubstituted linear, branched or alicyclic hydrocarbon group having 2 to 25 carbon atoms. The polymer has a polystyrene-reduced weight average molecular weight determined by gel permeation chromatography (GPC) of 3000 to 100,000.

REFERENCES:
patent: 5561194 (1996-10-01), Cornett et al.
patent: 6492086 (2002-12-01), Barclay et al.
patent: 6576787 (2003-06-01), Nakano et al.
patent: 7179578 (2007-02-01), Sato et al.
patent: 7186495 (2007-03-01), Maeda et al.
patent: 7202010 (2007-04-01), Yamada et al.
patent: 7700256 (2010-04-01), Barclay et al.
patent: 2003/0054286 (2003-03-01), Sato et al.
patent: 10-171122 (1998-06-01), None
patent: 2000-026446 (2000-01-01), None
patent: 2000-229898 (2000-08-01), None
patent: 2000-321772 (2000-11-01), None
patent: 2000-321772 (2000-11-01), None
patent: 2001-166474 (2001-06-01), None
patent: 2001-166478 (2001-06-01), None
patent: 2001-194792 (2001-07-01), None
patent: 2002-303978 (2002-10-01), None
patent: 2003-107708 (2003-04-01), None
Machine Translation of JP 10-171122; publication date: Jun. 1998.
Machine Translation of JP 2000-321772A; publication date: Nov. 2000.
International Search Report for International Application No. PCT/JP2009/053735, Mar. 24, 2009.
Written Opinion of the International Searching Authority (w/ International Preliminary Report) for International Application No. PCT/JP2009/053735, Oct. 12, 2010.

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