Radiation sensitive composition, microlens, process for...

Details Radiation sensitive composition, microlens, process for... Radiation sensitive composition, microlens, process for...

2004-12-15

2008-05-20

Shosho, Callie (Department: 1794)

Stock material or miscellaneous articles

Liquid crystal optical display having layer of specified...

With viewing layer of specified composition

C428S001100, C430S281100, C349S095000

Reexamination Certificate

active

07374799

ABSTRACT:
A radiation sensitive composition containing inorganic oxide particles; a copolymer of at least one unsaturated compound selected from the group consisting of an unsaturated carboxylic acid and an unsaturated carboxylic anhydride and other unsaturated compound different from the unsaturated compound; a polyfunctional unsaturated compound having at least two ethylenically unsaturated groups in the molecule; and a radiation sensitive polymerization initiator. The composition is useful for making a microlens.

REFERENCES:
patent: 5965328 (1999-10-01), Sano et al.
patent: 6010824 (2000-01-01), Komano et al.
patent: 6294313 (2001-09-01), Kobayashi et al.
patent: 6908655 (2005-06-01), Arakawa et al.
patent: 6946498 (2005-09-01), Kayanoki
patent: 2002/0006558 (2002-01-01), Kobayashi et al.
patent: 2002/0020832 (2002-02-01), Oka et al.
patent: 2003/0004221 (2003-01-01), Sakurai et al.
patent: 2003/0214718 (2003-11-01), Kaminsky et al.
patent: 2004/0094752 (2004-05-01), Ito et al.
patent: 0 832 917 (1998-04-01), None
patent: 10-268305 (1998-10-01), None
patent: 11-109417 (1999-04-01), None
patent: 2001-117114 (2001-04-01), None
patent: 2001-154181 (2001-06-01), None
patent: EP 01 548 497 (2005-06-01), None

Affiliated with

Also associated with

Rating

Radiation sensitive composition, microlens, process for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Radiation sensitive composition, microlens, process for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radiation sensitive composition, microlens, process for... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3982746